Improved reflectance and stability of Mo-Si multilayers
نویسندگان
چکیده
منابع مشابه
Improved Reflectance and Stability of Mo / Si Mu It i layers
Commercial EUV lithographic systems require multilayers with higher reflectance and better stability then that published to date. Interface-engineered MoISi multilayers with 70% reflectance at 13.5 nm wavelength (peak width of 0.545 nm) and 71% at 12.7 nm wavelength (peak width of 0.49 nm) were developed. These results were achieved with 50 bilayers. These new multilayers consist of Mo and Si l...
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Novel capping layer structures have been deposited on periodic Mo/Si multilayers to optimize reflectance at 30.4 nm. Design, deposition and characterization of such coatings are presented. Most of the structures proposed show improved performance with respect to standard Mo/Si multilayers and are stable over time. Reflectance at 121.6 nm and in the visible spectral range have been also tested t...
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The soft X-ray reflectivity characterization of Mo/Si multilayer deposited by electron beam evaporation is discussed. The measurements are performed on Indus-1 synchrotron storage ring. The interdiffusion of two-layer materials in multilayer leads to the formation of interlayers. To understand the influence of interlayers and interfacial roughness on soft X-ray reflectivity profile, simulation ...
متن کاملThe influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (λ=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriche...
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ژورنال
عنوان ژورنال: Optical Engineering
سال: 2002
ISSN: 0091-3286
DOI: 10.1117/1.1489426